TWI536047B - 擴散導光體及背光單元 - Google Patents

擴散導光體及背光單元 Download PDF

Info

Publication number: TWI536047B
Authority: TW; Taiwan
Prior art keywords: sheet; concave; convex pattern; light; uneven
Prior art date: 2007-02-21

Application number

TW103102368A

Other languages

English (en)

Chinese (zh)

Other versions

TW201418784A (zh

Inventor

岡安俊樹

森由紀惠

藤木保武

Original Assignee

王子控股股份有限公司

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2007-02-21

Filing date

2007-11-07

Publication date

2016-06-01

2007-02-21 Priority claimed from JP2007040694A external-priority patent/JP5211506B2/ja

2007-06-07 Priority claimed from JP2007151676A external-priority patent/JP5391529B2/ja

2007-06-07 Priority claimed from JP2007151795A external-priority patent/JP4683011B2/ja

2007-06-07 Priority claimed from JP2007151677A external-priority patent/JP5135539B2/ja

2007-10-04 Priority claimed from JP2007261176A external-priority patent/JP5391539B2/ja

2007-11-07 Application filed by 王子控股股份有限公司 filed Critical 王子控股股份有限公司

2014-05-16 Publication of TW201418784A publication Critical patent/TW201418784A/zh

2016-06-01 Application granted granted Critical

2016-06-01 Publication of TWI536047B publication Critical patent/TWI536047B/zh

Links

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PLSARIKBYIPYPF-UHFFFAOYSA-H trimagnesium dicitrate Chemical compound [Mg+2].[Mg+2].[Mg+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O PLSARIKBYIPYPF-UHFFFAOYSA-H 0.000 description 2
SOLUNJPVPZJLOM-UHFFFAOYSA-N trizinc;distiborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-][Sb]([O-])([O-])=O.[O-][Sb]([O-])([O-])=O SOLUNJPVPZJLOM-UHFFFAOYSA-N 0.000 description 2
239000006097 ultraviolet radiation absorber Substances 0.000 description 2
229920006305 unsaturated polyester Polymers 0.000 description 2
238000007738 vacuum evaporation Methods 0.000 description 2
238000012935 Averaging Methods 0.000 description 1
239000004593 Epoxy Substances 0.000 description 1
YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
241000549556 Nanos Species 0.000 description 1
229930182556 Polyacetal Natural products 0.000 description 1
239000005062 Polybutadiene Substances 0.000 description 1
239000004698 Polyethylene Substances 0.000 description 1
229920001328 Polyvinylidene chloride Polymers 0.000 description 1
229920007962 Styrene Methyl Methacrylate Polymers 0.000 description 1
235000010724 Wisteria floribunda Nutrition 0.000 description 1
229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
125000002723 alicyclic group Chemical group 0.000 description 1
125000001931 aliphatic group Chemical group 0.000 description 1
WYTGDNHDOZPMIW-RCBQFDQVSA-N alstonine Natural products C1=CC2=C3C=CC=CC3=NC2=C2N1C[C@H]1[C@H](C)OC=C(C(=O)OC)[C@H]1C2 WYTGDNHDOZPMIW-RCBQFDQVSA-N 0.000 description 1
238000007611 bar coating method Methods 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
229910001634 calcium fluoride Inorganic materials 0.000 description 1
239000003054 catalyst Substances 0.000 description 1
NCEXYHBECQHGNR-UHFFFAOYSA-N chembl421 Chemical compound C1=C(O)C(C(=O)O)=CC(N=NC=2C=CC(=CC=2)S(=O)(=O)NC=2N=CC=CC=2)=C1 NCEXYHBECQHGNR-UHFFFAOYSA-N 0.000 description 1
239000000470 constituent Substances 0.000 description 1
229920001577 copolymer Polymers 0.000 description 1
238000007865 diluting Methods 0.000 description 1
238000001312 dry etching Methods 0.000 description 1
BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 1
238000010894 electron beam technology Methods 0.000 description 1
238000000609 electron-beam lithography Methods 0.000 description 1
238000004049 embossing Methods 0.000 description 1
238000005530 etching Methods 0.000 description 1
LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
239000004744 fabric Substances 0.000 description 1
YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 description 1
229910052731 fluorine Inorganic materials 0.000 description 1
239000011737 fluorine Substances 0.000 description 1
229910052736 halogen Inorganic materials 0.000 description 1
125000005843 halogen group Chemical group 0.000 description 1
150000002367 halogens Chemical class 0.000 description 1
WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
238000007641 inkjet printing Methods 0.000 description 1
238000007689 inspection Methods 0.000 description 1
150000002632 lipids Chemical class 0.000 description 1
ADFPJHOAARPYLP-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;styrene Chemical compound COC(=O)C(C)=C.C=CC1=CC=CC=C1 ADFPJHOAARPYLP-UHFFFAOYSA-N 0.000 description 1
238000000059 patterning Methods 0.000 description 1
239000008188 pellet Substances 0.000 description 1
230000035699 permeability Effects 0.000 description 1
238000000206 photolithography Methods 0.000 description 1
239000000088 plastic resin Substances 0.000 description 1
229920003205 poly(diphenylsiloxane) Polymers 0.000 description 1
229920003216 poly(methylphenylsiloxane) Polymers 0.000 description 1
229920003050 poly-cycloolefin Polymers 0.000 description 1
229920000768 polyamine Polymers 0.000 description 1
229920000573 polyethylene Polymers 0.000 description 1
229920005644 polyethylene terephthalate glycol copolymer Polymers 0.000 description 1
229920002098 polyfluorene Polymers 0.000 description 1
239000003505 polymerization initiator Substances 0.000 description 1
229920005990 polystyrene resin Polymers 0.000 description 1
239000005033 polyvinylidene chloride Substances 0.000 description 1
239000000843 powder Substances 0.000 description 1
238000010248 power generation Methods 0.000 description 1
230000000644 propagated effect Effects 0.000 description 1
230000005855 radiation Effects 0.000 description 1
239000005871 repellent Substances 0.000 description 1
238000007650 screen-printing Methods 0.000 description 1
239000002356 single layer Substances 0.000 description 1
229920003048 styrene butadiene rubber Polymers 0.000 description 1
229920001909 styrene-acrylic polymer Polymers 0.000 description 1
239000000126 substance Substances 0.000 description 1
230000008093 supporting effect Effects 0.000 description 1
230000007704 transition Effects 0.000 description 1
ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
238000007740 vapor deposition Methods 0.000 description 1

Classifications

- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/005—Arrays characterized by the distribution or form of lenses arranged along a single direction only, e.g. lenticular sheets
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0043—Inhomogeneous or irregular arrays, e.g. varying shape, size, height

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Optics & Photonics (AREA)
Optical Elements Other Than Lenses (AREA)
Engineering & Computer Science (AREA)
Manufacturing & Machinery (AREA)
Laminated Bodies (AREA)

TW103102368A 2007-02-21 2007-11-07 擴散導光體及背光單元 TWI536047B (zh)

Applications Claiming Priority (5)

Application Number	Priority Date	Filing Date	Title
JP2007040694A JP5211506B2 (ja)	2007-02-21	2007-02-21	凹凸パターン形成シートならびにその製造方法、反射防止体、位相差板および光学素子製造用工程シート。
JP2007151676A JP5391529B2 (ja)	2007-06-07	2007-06-07	凹凸パターン形成シートの製造方法
JP2007151795A JP4683011B2 (ja)	2007-06-07	2007-06-07	凹凸パターン形成シートおよびその製造方法、光拡散体、光拡散体製造用工程シート原版ならびに光拡散体の製造方法
JP2007151677A JP5135539B2 (ja)	2007-06-07	2007-06-07	拡散導光体およびバックライトユニット
JP2007261176A JP5391539B2 (ja)	2007-10-04	2007-10-04	光学シートとその製造方法

Publications (2)

Publication Number	Publication Date
TW201418784A TW201418784A (zh)	2014-05-16
TWI536047B true TWI536047B (zh)	2016-06-01

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Family Applications (7)

Application Number	Title	Priority Date	Filing Date
TW103102369A TWI545351B (zh)	2007-02-21	2007-11-07	凹凸圖案形成片及其製造方法
TW105114333A TWI598638B (zh)	2007-02-21	2007-11-07	光擴散體
TW103102364A TWI530713B (zh)	2007-02-21	2007-11-07	凹凸圖案形成片及其製造方法
TW096142138A TWI448736B (zh)	2007-02-21	2007-11-07	凹凸圖案形成片及其製造方法
TW103125350A TWI518376B (zh)	2007-02-21	2007-11-07	凹凸圖案形成片及其製造方法
TW103102372A TWI536048B (zh)	2007-02-21	2007-11-07	凹凸圖案形成片及其製造方法
TW103102368A TWI536047B (zh)	2007-02-21	2007-11-07	擴散導光體及背光單元

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Application Number	Title	Priority Date	Filing Date
TW103102369A TWI545351B (zh)	2007-02-21	2007-11-07	凹凸圖案形成片及其製造方法
TW105114333A TWI598638B (zh)	2007-02-21	2007-11-07	光擴散體
TW103102364A TWI530713B (zh)	2007-02-21	2007-11-07	凹凸圖案形成片及其製造方法
TW096142138A TWI448736B (zh)	2007-02-21	2007-11-07	凹凸圖案形成片及其製造方法
TW103125350A TWI518376B (zh)	2007-02-21	2007-11-07	凹凸圖案形成片及其製造方法
TW103102372A TWI536048B (zh)	2007-02-21	2007-11-07	凹凸圖案形成片及其製造方法

Country Status (4)

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KR (5)	KR101193615B1 (fr)
CN (3)	CN102628969B (fr)
TW (7)	TWI545351B (fr)
WO (1)	WO2008102487A1 (fr)

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2007
- 2007-11-07 KR KR1020097017337A patent/KR101193615B1/ko active Active
- 2007-11-07 KR KR1020127017847A patent/KR101414004B1/ko not_active Expired - Fee Related
- 2007-11-07 KR KR1020157003702A patent/KR101541288B1/ko active Active
- 2007-11-07 CN CN201210109843.6A patent/CN102628969B/zh not_active Expired - Fee Related
- 2007-11-07 TW TW103102369A patent/TWI545351B/zh not_active IP Right Cessation
- 2007-11-07 TW TW105114333A patent/TWI598638B/zh active
- 2007-11-07 TW TW103102364A patent/TWI530713B/zh active
- 2007-11-07 TW TW096142138A patent/TWI448736B/zh active
- 2007-11-07 WO PCT/JP2007/071635 patent/WO2008102487A1/fr not_active Ceased
- 2007-11-07 CN CN201410354369.2A patent/CN104122612B/zh not_active Expired - Fee Related
- 2007-11-07 TW TW103125350A patent/TWI518376B/zh active
- 2007-11-07 CN CN 201110020355 patent/CN102176079B/zh not_active Expired - Fee Related
- 2007-11-07 KR KR1020147002311A patent/KR101456522B1/ko not_active Expired - Fee Related
- 2007-11-07 TW TW103102372A patent/TWI536048B/zh not_active IP Right Cessation
- 2007-11-07 KR KR1020147002312A patent/KR101541287B1/ko not_active Expired - Fee Related
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* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US10866352B1 (en)	2019-07-10	2020-12-15	Chicony Power Technology Co., Ltd.	Light emitting device

Also Published As

Publication number	Publication date
TWI536048B (zh)	2016-06-01
KR101541288B1 (ko)	2015-08-03
TWI598638B (zh)	2017-09-11
KR20120085940A (ko)	2012-08-01
TW201418784A (zh)	2014-05-16
TWI518376B (zh)	2016-01-21
CN104122612A (zh)	2014-10-29
TW201418783A (zh)	2014-05-16
CN102628969B (zh)	2014-10-08
TW201418785A (zh)	2014-05-16
CN102176079A (zh)	2011-09-07
TWI545351B (zh)	2016-08-11
KR20140027530A (ko)	2014-03-06
KR20090125061A (ko)	2009-12-03
TWI530713B (zh)	2016-04-21
TW201418786A (zh)	2014-05-16
KR20150027304A (ko)	2015-03-11
TW200912388A (en)	2009-03-16
CN102176079B (zh)	2013-01-23
TW201447389A (zh)	2014-12-16
KR101456522B1 (ko)	2014-11-04
KR20140027529A (ko)	2014-03-06
KR101414004B1 (ko)	2014-08-05
CN104122612B (zh)	2017-04-12
KR101541287B1 (ko)	2015-08-03
CN102628969A (zh)	2012-08-08
WO2008102487A1 (fr)	2008-08-28
KR101193615B1 (ko)	2012-10-26
TW201631332A (zh)	2016-09-01
TWI448736B (zh)	2014-08-11

Publication	Publication Date	Title
TWI536047B (zh)	2016-06-01	擴散導光體及背光單元
JP5182658B2 (ja)	2013-04-17	凹凸パターン形成シートの製造方法、および光学素子の製造方法
JP5211506B2 (ja)	2013-06-12	凹凸パターン形成シートならびにその製造方法、反射防止体、位相差板および光学素子製造用工程シート。
JP5098450B2 (ja)	2012-12-12	凹凸パターン形成シートの製造方法および凹凸パターン形成シート
JP5391539B2 (ja)	2014-01-15	光学シートとその製造方法
JP2009282279A (ja)	2009-12-03	反射シートおよびバックライトユニット
JP5522287B2 (ja)	2014-06-18	光学シートおよびその工程シート原版
JP5636907B2 (ja)	2014-12-10	凹凸パターン形成シートおよびその製造方法、凹凸パターン形成シート複製用工程シート原版、光学素子、２次工程用成形物、複製シート
JP5135539B2 (ja)	2013-02-06	拡散導光体およびバックライトユニット
JP2014002411A (ja)	2014-01-09	凹凸パターン形成シートおよびその製造方法、光拡散体製造用工程シート原版ならびに光拡散体の製造方法

TWI536047B - 擴散導光體及背光單元 - Google Patents

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